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Fully automated SIMS for for high-volume semiconductor manufacturing

The AKONIS SIMS tool fills a critical gap in semiconductor fabrication processes by providing high throughput, high precision detection for implant profiles, composition analysis and interfacial data to enable high-volume manufacturing. AKONIS provides a very high level of automation to ensure repeatability across tools for fab level process control and tool-to-tool matching.
  • AKONIS: SIMS Excellence Brought to the Fab! +

    Complementing the IMS Wf/SC Ultra as well as the SIMS 4550 (quadrupole SIMS) used to support the semiconductor industry via characterization labs, AKONIS - with full automation of instrument set-up and acquisition routines - enables rapid, within-fab analysis without compromise in analytical sensitivity. AKONIS benefits from recent development in EXtremely Low Impact Energy (EXLIE) ionic column technology (< 150 eV), coupled with a full wafer handling system including a high resolution stage enabling measurements on pads down to 20 μm.

    The high yield enabler on N5 and beyond

    • High resolution composition and fast dopant depth profiling of SiGe and SiP multilayer stacks
    • Unrivalled in pad detection limits down to 20 μm
    • More than 97% of time reduction to feedback data to the process line
    • Blanket and patterned full wafer measurement
    • Pattern recognition engine coupled with high resolution interferometric stage for < 2 μm position accuracy
    • Intuitive recipe creation based on unique material database
    • SEMI certified (S2/S8, E4, E5, E39, E84...)
    • Low cost of ownership
  • View Webinars +

    • Dynamic SIMS for Semiconductors

      Thursday, September 16, 2021

      A review of a broad array of IC applications with Dynamic SIMS, from deep to ultra-shallow implant depth profiling in Si-based semiconductors to compositional analysis of thin multilayers in patterned wafer pads, optoelectronics, 2D and non-planar 3D structures. Speaker: Pawel Michałowski, expert-user of CAMECA SC Ultra SIMS at Łukasiewicz Research Network – Institute of Microelectronics and Photonics, Poland
      Duration : 20 minutes
      Click here to view
  • Documentation & white papers +

  • Video +