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ECR Source Applications

The versatility of ECR sources in producing both ions and electrons makes them valuable in a broad range of scientific and industrial applications. In materials science, they are employed for thin film deposition and surface modification. In nuclear physics, ECR sources are crucial for producing high-charge-state ions for accelerators and experimental research. Additionally, in the semiconductor industry, they are used for ion implantation processes to modify the electrical properties of materials.
  • Ion beam sputter deposition system applying a focused ion beam to a target material, facilitating thin film coating on a substrate
    Ion beam sputter deposition

    Ion Beam Sputter Deposition (IBSD) is a physical vapor deposition (PVD) technique that consists in adding a thin film to the substrate surface to improve its material properties. Traditional challenges of IBSD such as high maintenance, high level of complexity, and difficulty to scale up are overcome thanks to CAMECA’s unique ECR technology.

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  • Ion implantation apparatus directing high-energy ions into a semiconductor wafer to modify its electrical properties.
    Ion implantation

    Ion implantation consists in adding ions to the interior of a substrate to change its elemental composition and improve material properties. It is commonly used for steel toughening, medical implants, and semiconductor device fabrication.

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  • Ion implantation apparatus directing high-energy ions into a semiconductor wafer to modify its electrical properties.
    Ion beam figuring (IBF)

    Ion Beam Figuring consists in locally sputtering atoms in order to create a surface with a specified profile. It is a used for precise figuring and finishing of optical elements, such as spheres, aspheres and free forms on lenses and mirrors. CAMECA’s ECR technology and ion optics system offer the highest flexibility in beam size, shape, and energy.

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  • Ion beam system performing etching and polishing processes on a material surface to achieve desired microstructures.
    Etching, cleaning, polishing & milling

    Sputter cleaning, ion polishing, milling and cutting are all based on Ion Beam Sputtering. They are used as a surface preparation step before depositing a thin film, before high resolution imaging or surface analysis as well as for nanostructuring a surface. CAMECA’s ECR technology delivers stable and reliable beams, eliminating the maintenance required with filament-based technologies.

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  • Ion assisted deposition setup enhancing thin film growth by bombarding the substrate with low-energy ions during deposition.
    Ion assisted deposition

    Ion Assisted Deposition consists in modifing the properties of a growing thin film by directing an ion beam at it. It can also be used to purposely introduce compressive stress in the film to improve its mechanical properties. The stability and reliability of CAMECA ECR technology is attractive for ion assistance applications.

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  • Advanced instrumentation used in nuclear and atomic physics research for analyzing atomic structures and reactions.
    Nuclear and atomic physics

    CAMECA high energy single cavity sources are used in various setups for nuclear and atomic physics, ranging from particle injection into electrostatic storage rings or charge boosters, to power testing of future neutron detectors.

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