IMS 7f-Auto
Versatile SIMS Tool: Reference Detection Sensitivity with High Throughput
Designed to deliver high precision elemental and isotopic analyses with increased ease-of-use and productivity, it has been optimized for challenging applications such as glass, metals, ceramics, Si-based, III-V and II-VI devices, bulk materials, thin films... fulfilling industry requirements for efficient device development and process control.

Product Details
Key analytical features for solving a wide range of analytical problems
The IMS 7f-Auto offers unparalleled depth profiling capabilities with high depth resolution and high dynamic range. The high transmission mass spectrometer is combined with two reactive, high-density ion sources, O2+ and Cs+, thus providing high sputter rate and excellent detection limits. A unique optical design allows both direct ion microscopy and scanning microprobe imaging.
Improved automation & operation efficiency
The IMS 7f-Auto is equipped with a redesigned, in-line primary column for easier and faster primary beam tuning and optimized primary beam current stability. New automated routines minimize operator related biases and improve ease-of-use. A motorized storage chamber with automated load / unload of sample holders ensures high throughput through analysis chaining and remote operation.
High reproducibility at high throughput
Thanks to its new motorized storage chamber & sample transfer, the IMS 7f-Auto can analyze multiple samples in chained or remote mode. Measurements can be fully unattended and automated, with unequalled throughput and reproducibility. Ultimate reproducibility can be achieved (RSD < 0.5 %), together with excellent detection limits, high throughput and productivity (tool can be used 24h a day with minimum operator intervention).
Benefits
Discover the key advantages that set our solution apart. From increased efficiency to exceptional support, these benefits are designed to deliver real value and help you achieve more with confidence.
Webinars

Dynamic SIMS for Ion Implants: Fundamental Concepts and Applications
A technical webinar on ion implant use for SIMS quantification and common pitfalls, co-hosted by Loughborough Surface Analysis Ltd and CAMECA.

Enhanced Characterization of Very Deep Proton Implants with Dynamic SIMS
Explore the superior capabilities of Dynamic SIMS for analyzing low-dose deep proton implants in industrially relevant silicon with Orazio Samperi, University of Catania/ST Microelectronics.

SIMS Analysis of an Oxide Thin Film with Continuous Composition Gradient
Explore the application of Dynamic SIMS on thin film analysis with our speaker Joseph Scola, from the University of Paris-Saclay/UVSQ.



