TES-100

Compact ECR source on CF100 flange, up to 30kV beam

 

TES-100 is based on a TES cavity mounted on a ConFlat CF100 flange and can sustain beam energies up to 30kV.

TES‑100 ECR source

Product Details

We offer two versions of TES-100:

  • The Ions High Brightness can include an Einzel lens to further increase brightness and modulate the beam shape. It is ideal for mass spectrometry, milling, etching, beam line, and ion implantation applications.

  • The Electrons version can be used for various applications requiring high energy electron beams up to 30kV (electrons chemistry, evaporation)

Adding the bipolar option allows you to alternatively generate ions and electrons, and thus to address various applications with a single source.

Benefits

Discover the key advantages that set our solution apart. From increased efficiency to exceptional support, these benefits are designed to deliver real value and help you achieve more with confidence.

flange
CF100 flange
Icon ZAP
Up to 30 kV
Research and Development
Auto start procedure
Low maintenance
Easy & cost-effective maintenance
Vacuum applications
UHV compatible design

Downloads

Data Sheet

TES Pulsed Mode Option

PDF

Flyer

TES‑100

PDF
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