HEXAR
Broad Beam ECR source for surface processing in vacuum
HEXAR is composed of a hexagonal arrangement of mini microwave cavities that each operate an ECR discharge at ultra low RF power (a few Watts per cavity at 2.45 GHz).

Product Details
HEXAR is composed of a hexagonal arrangement of mini microwave cavities that each operate an ECR discharge at ultra low RF power (a few Watts per cavity at 2.45 GHz).
This approach is successful because of the reliability and stability of the ECR plasma, and the fact that the source has no consumables.
In addition, it enables control over the current density profile of the beam, in a way inaccessible to standard broad beam sources. The current density profile can be varied both in shape and in amplitude through the combination of gas flow, optics, and applied RF power.
HEXAR is a scalable concept that enables the fabrication of sources adapted to the treatment of a wide range of surface sizes. Typical applications are ion beam etching, surface cleaning, ion assisted deposition and ion beam sputter deposition.
Benefits
Discover the key advantages that set our solution apart. From increased efficiency to exceptional support, these benefits are designed to deliver real value and help you achieve more with confidence.




