TES-40

Compact ECR source on CF40 flange, up to 5kV beam

 

TES-40 is based on a TES cavity mounted on a ConFlat CF40 flange and can sustain beam energies up to 5kV.

TES‑40 ECR source

Product Details

TES-40 is available in three versions:

  • The Ions High Brightness version often comes along an Einzel lens and is ideal for sputtering, milling, etching and figuring applications.

  • The Ions Broad Beam version is ideal for cleaning and polishing applications.

  • The Electrons version can be used as a neutralizer to generate a low energy electron beam for charge compensation or plasma chemistry studies up to 5kV.

Adding the bipolar option allows you to alternatively generate ions and electrons, and thus to address various applications with a single source.

 

Benefits

Discover the key advantages that set our solution apart. From increased efficiency to exceptional support, these benefits are designed to deliver real value and help you achieve more with confidence.

flange
CF40 flange
Icon ZAP
Up to 5 kV
Research and Development
Auto start procedure
Low maintenance
Easy & cost-effective maintenance
Vacuum applications
UHV compatible design

Downloads

Data Sheet

TES Pulsed Mode Option

PDF

TES‑40 Electron Source / Neutralizer

PDF

TES‑40 Electron Source / Neutralizer Ultra‑Low Power

PDF

TES‑40 High Brightness with Einzel Lens

PDF

TES‑40 Ions Broad Beam

PDF

Flyer

TES-40

PDF
ecr

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