ECR Sources Applications
Browse all applications of ECR sources
The versatility of ECR sources in producing both ions and electrons makes them valuable in a broad range of scientific and industrial applications. In materials science, they are employed for thin film deposition and surface modification. In nuclear physics, ECR sources are crucial for producing high-charge-state ions for accelerators and experimental research. Additionally, in the semiconductor industry, they are used for ion implantation processes to modify the electrical properties of materials.
ECR Sources Application
Ion Beam Sputter Deposition
Ion Beam Sputter Deposition (IBSD) is a physical vapor deposition (PVD) technique that consists in adding a thin film to the substrate surface to improve its material properties.
ECR Sources Application
Ion Implantation
Ion implantation consists in adding ions to the interior of a substrate to change its elemental composition and improve material properties. It is used for example in tool steel toughening, medical implants, and in semiconductor device fabrication.
ECR Sources Application
Ion Beam Figuring
Ion Beam Figuring (IBF) is an advanced precision finishing technology used to achieve highly accurate surface profiles on high value optical components, including spheres, aspheres, and freeform optics. By locally sputtering atoms from the surface, IBF delivers ultra fine corrections after mechanical polishing, making it the preferred final step for producing state of the art mirrors and lenses.
ECR Sources Application
Etching, Cleaning, Polishing & Milling
Sputter cleaning, ion polishing, ion milling, ion cutting are all based on ion beam sputtering. They are used as a surface preparation step before depositing a thin film, before high resolution imaging or surface analysis.
ECR Sources Application
Ion Assisted Deposition
The goal of ion assisted deposition is to modify the properties of a growing thin film by directing an ion beam at it. Ion assistance is often used in combination with thin film deposition by evaporation or other techniques, for which the kinetic energy of the arriving particles is low.
ECR Sources Application
Nuclear & Atomic Physics
Our high energy single cavity sources are used in various setups for nuclear and atomic physics, ranging from particle injection into electrostatic storage rings or charge boosters, to power testing of future neutron detectors.
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