TES-63

Compact ECR source on CF63 flange, up to 15kV beam

 

TES-63 is based on a TES cavity mounted on a ConFlat CF63 flange and can sustain beam energies up to 15kV.

TES‑63 ECR source

Product Details

TES-63 is available in three versions:

  • The Ions Broad Beam version can address various applications such as sputtering, milling, cleaning, and polishing.

  • The Ions High Brightness version can come single-handed or include an Einzel lens to increase brightness and modulate the beam shape. It is ideal for mass spectrometry, milling, etching, and beam line applications.

  • The Electrons' version can be used for various applications requiring electron beams up to 15kV (electrons chemistry, cleaning, defects correction)

  • TES-63 is the only TES model offering a scanner option, which allows you to precisely deflect the beam and browse over a given surface. The beam trajectory can follow a raster scan or an arbitrary curve thanks to a waveform generator.

Adding the bipolar option allows you to alternatively generate ions and electrons, and thus to address various applications with a single source.

 

Benefits

Discover the key advantages that set our solution apart. From increased efficiency to exceptional support, these benefits are designed to deliver real value and help you achieve more with confidence.

flange
CF63 flange
Icon ZAP
Up to 15 kV
Research and Development
Auto start procedure
Low maintenance
Easy & cost-effective maintenance
Vacuum applications
UHV compatible design

Downloads

Data Sheet

TES Pulsed Mode Option

PDF

TES‑63 Electron Source

PDF

Flyer

TES‑63

PDF
ECR Community people meeting

Visit our ECR community

Read testimonials and keep up to date with ECR research