The AKONIS SIMS tool addresses a crucial need in semiconductor fabrication, offering high throughput and precision for implant process control, patterned wafer monitoring, compositional analysis, and interfacial data. Its exceptional level of automation ensures long-term repeatability, facilitating fab-level process control and tool-to-tool matching for High-Volume Manufacturing.
Watch this introductory video for an overview of applications & the technique behind!
📥 AKONIS product brochure
Statistical Process Control of logic p-mos with AKONIS SIMS
Thanks to a proven single detector technology, the AKONIS automated SIMS tool ensures unequalled long-term stability Boron in SiGe monitoring at customer site.
📥 Application note - Statistical Process Control of p-mos Logic: B:SiGe Monitoring
SiP metrology for logic n-mos production with AKONIS SIMS
Contrary to multiple detector SIMS tools which fail at detecting phosphorus in silicon, AKONIS performs long-term stability monitoring of shallow P implants.
📥 Application note - SiP Shallow Implant Metrology for n-mos Logic Production
Arsenic shallow implant monitoring with AKONIS SIMS - maximize your production yields!
AKONIS outperforms other analytical systems for dose uniformity control at customer site: the tool measured 1.2% non-uniformity on arsenic shallow implants over full wafers!
📥 Application note - Arsenic Shallow Implant Monitoring
Monitoring of etching processes in a HVM environment with AKONIS SIMS
The AKONIS SIMS tool accurately measures elemental concentrations in novel forksheet 3D structures for different etching rates.