High Performance 3D Atom Probe for Semiconductors, Electronic Devices, and Nanomagnetics
The LEAP 5000 XSTM is a high performance atom probe microscope which provides nano-scale surface, bulk and interfacial materials analysis of simple and complex structures with atom-by-atom identification and accurate spatial positioning.
The system works using the principle of field evaporation, whereby a strong electric field applied to the specimen is sufficient to cause removal of atoms by ionization. Atom removal is triggered either via a voltage or laser pulse applied to the sample.
The LEAP 5000 XS provides the following key features:
- Fastest data collection speed
- Local electrode and microtip compatibility
- Variable flight path
High yield design
The system uses a UV laser with a tightly focused spot when in laser mode. The use of UV wavelength enables a wide variety of materials, including many insulators, to be analyzed while the computer controlled alignment of the laser spot with the specimen assures the highest possible success rates.
Local Electrode and Microtips
The name "LEAP" is derived from Local Electrode Atom Probe. The local electrode provides both ease of use and data quality as well as enabling the use of prefabricated MicrotipTM arrays. Using these enables multiple analytical specimens to be prepared, mounted and loaded into the instrument for maximum efficiency with multi-user and/or multi-experiment scenarios.
Constant Wide Field of View
The LEAP 5000 XSTM is a straight flight-path system which allows up to 1 MHz laser pulsing for fast throughput, high data collection efficiency and large field of view. The improved electrostatic flight-path length provides a constant angular field of view for the most accurate data reconstructions.