TXRF 8300W
 
FAB-LINE METROLOGY TOOL
for SURFACE CONTAMINATION CONTROL


 The CAMECA TXRF 8300W is a turnkey system designed to meet the needs for fully automated semiconductor fab application.
The TXRF 8300W measures Quantitative Trace Element Surface Contamination on semiconductor wafers, down to less than 1E10 atoms/cm² in direct measurement. Surface preparation (VPD) can improve this by almost three orders of magnitude.
 


The TXRF 8300W is fully compatible with SMIF 200mm, Open Cassette 200mm and FOUP 300mm standards and follows SECS/GEM automation. It meets factory-required host communication protocols and is fully compliant with SEMI standards. It works at atmospheric pressure for the highest throughput in FAB environment.

It provides Full Wafer Analysis and Mapping and is based on the non-destructive TXRF technique (Total X-Ray Fluorescence under X-ray irradiation at grazing incidence). The technique is totally quantitative without the need for specific standards, and its non-destructiveness allows re-measurements when needed or for further investigations.
The instrument operates at atmospheric pressure guaranteeing the highest uptime, reliability and stability and is straightforward to use.