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IMS Wf,
SC Ultra 

IN-FAB AND ULE SIMS 

The CAMECA IMS Wf and SC Ultra are designed to meet the increasing needs for dynamic SIMS measurements in advanced semiconductors.
A first requisite is the optimization of SIMS analytical conditions for ultra-shallow depth profiling. This requires sputtering at Ultra-Low Energy with well-controlled conditions (species, angle, gas flooding).
As SIMS technique matures, users want to reduce the expertise required to achieve high reproducibility and high precision measurements. The trend is clearly toward unattended, automated analysis.
The capability of full wafer analysis and mapping is a growing demand due in part to the increased cost of the 200mm or 300mm wafers. In addition, due to the increasing complexity of manufacturing processes, measurements from small test areas of patterned wafers are now prefered to blank wafer analysis, in order to be really representative of the product. This increases the need for high transmission instruments (magnetic sector SIMS capable of high sensitivity from small sputtered craters).
Finally, a ULE-SIMS should also be capable of high sample throughput and fast deep depth profiling.
 Common main features:
  • Two ion columns in order to sputter down to 250 eV impact energy (for O2+ and Cs+ ): one floating primary column at 58° with Cs and/or duoplasmatron; a second column at 36° with duoplasmatron and accel-decel.
  • New Shielded Multi-mode Immersion Lens (SMIL) allowing the simultaneous combination of high analyzer transmission (high extraction field) and Ultra Low impact Energy capabilities at optimum sputter angles. 
  • Factory aligned primary ion column without any moveable aperture. 
  • Analyzer fully computer-controlled with motorized apertures.
  • Automated, unattended sequential analysis. Full remote control with simple interface.
  • 3 axis X-Y-Z horizontal stage with automated sample height correction using a Z-autofocus for best reproducibility.
  • Two sample-parking positions in the load-lock.
  • Eucentric rotating stage option, compatible with full wafer analysis, for  improvement of depth resolution through the reduction of sample roughening e.g. in metallic layers.
 Different versions:
  • SC Ultra:
    - 75 mm x 75 mm maximum sample size. Loading of up to  25 samples (8x8mm) in one batch.
     - Manual 75 mm load-lock & sample transfer.

  • IMS Wf:
    - 300 mm x 300 mm maximum sample size: accepts 300 mm or 200 mm wafer, five 100 mm wafers, seventeen 50mm wafers or shuttle loaded with small pieces.
    - Sample loading and exchange automated using commercial 300 mm robotics
    - Optional cassette to cassette loader (FOUP & SMIF).