1- Introduction to the Atom probe
Tomographic Atom Probe is a
quantitative technique that provides atomic scale 3D elemental mapping
of chemical heterogeneities in materials. As with STM (scanning tunneling microscopy), a single
atom and its neighbours can be imaged. But the Atom Probe provides two big plusses:
- Elemental analysis: each single atom is chemically identified.
- Depth resolution, which makes the chemical map of the atoms truly 3D.
CAMECA is marketing, manufacturing, installing and servicing the LA-WATAP Atom Probe instrument, based on a collaboration and transfer technology agreement with the
GPM (Groupe de Physique des Matériaux),
at Rouen University, France. In this instrument, single atoms are field-evaporated
from the sample surface and projected toward a position-sensitive detector.
Atoms are chemically identified by Time-Of-Flight Mass Spectrometry. The in-depth
investigation of the material reveals the 3D-distribution of atoms in the
material on an atomic scale.
The sample is prepared in the form of a very sharp tip (radius = 10-70
nm). For metallic samples electro-erosion is used; for semiconductors
Focused Ion Beam (FIB) milling is generally used: a rectangle of the
wafer is protected with a metallization, a slice of sample of a
few micron size is FIB-cut, extracted and attached (by FIB-metal deposition) in-situ onto a pilar
support. It is then finely FIB-milled in a conical shape to obtain a
sharp tip.
This tip is maintained under UHV condition at 15-70° K temperature during
the analysis, to ensure reliable composition information.
2-
Atom probe application examples
Courtesy for data above: University of Rouen, see the bottom of the page.
3- Working mode of the LASER- Assisted Atom Probe
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The
cooled tip is biased at a high DC voltage (5-20 kV) and positioned very
near a counter electrode. The very small radius of the tip and the High
Voltage induce a very high electrostatic field (tens MV/mm) at the tip
surface, just below the point of atom evaporation.
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A very short pulse
of LASER on the tip gives 1) the extra energy required for evaporation
of a few surface atoms 2) the Start signal for the flight of the
ions. Indeed under the high local electrostatic field, the evaporated
atoms are immediately ionized by electron tunneling, and accelerated by
the field into a Time Of Flight tube. They fly in Ultra High Vacuum and
are projected straight on a Position-Sensitive Detector. The detector
gives an accurate measurement of the ion impact positions and masses (= time
of flight). The very high magnification of the instrument (about 107)
yields highly accurate (0.2 nm) impact coordinates, from which the
atom
original positions at the tip surface are derived. The time of flight
gives
the chemical nature of positioned ions. By repeating this sequence the
atoms of tip are progressively removed and a 3D image of the material
can be reconstructed on an atomic scale. The type of LASER technology used is
crucial: CAMECA use a very fast (femto-second pulse) LASER in order to
reduce the heating of the sample. Longer pulses (ex: pico-second LASER)
degrade the mass resolution by thermal evaporation and can lead to
redistribution/diffusion of the atoms during the pulse, specially if
the sample thermal conductivity is low (semiconductors or insulators).
4- High Voltage mode
For conductive samples the LASER pulse can be
replaced by a small HV pulse superimposed to the DC counter electrode
HV. This technique is mature and has produced most of the results in
metallurgy, nuclear and material science. The drawbacks are a
relatively low rate of success as the HV pulsing induces fatigue on the
sample often leading to a brakage of the tip during analysis. It
is limited to conductive samples. This is why it is progressively being
replaced by the more efficient and powerful LASER evaporation technique.
Courtesy for displayed data:
- Cottrel atmosphere: E. Cadel, university of Rouen. D. Blavette, E. Cadel, A. Fraczkiewicz,
A.Menand, Science, 17 dec 1999, volume 286, p. 2317-2319.
- Cu precipitate in Fe-Cul alloy : Ph. Pareige, univ. Rouen.
- Irradiated nuclear reactor steel: Ph. Pareige, Univ. Rouen.
- Ag/Al diffusion:
Schleiwies & Schmitz, Göttingen univ.
- Multi-layer deposition: Univ. Gottingen.
- Cu nanowire: X. Sauvage, Univ. Rouen.